Recently, the Ministry of Science and Technology "14th Five-Year Plan" national key research and development program "new display and strategic electronic materials" key special "crystal thin film processing and a new generation of gain device preparation" project The kick-off meeting and implementation program discussion meeting was held in Shenzhen University of Technology.
National Key R&D Program Project Launch Daqo Laser Participates in the Research and Development of High-energy Thin-Film Lasers
The project is oriented to the national demand for high-power, high-energy ultrashort pulse laser advanced light source, for crystal sheet processing and a new generation of gain device preparation of key scientific and technical issues to carry out research, collaborative research, the development of independent intellectual property rights and features of high-energy sheet of ultrafast laser technology and industrial applications.
It is reported that the project is led by the Shenzhen University of Technology, jointly with the Chinese Academy of Engineering Physics Shanghai Laser Plasma Research Institute, Jiangsu Normal University, the Chinese Academy of Sciences Semiconductor Research Institute, Jiangsu Institute of Third Generation Semiconductor Research Institute to undertake.
Thin Disk Lasers ((TDLs)) are a class of potential high power laser sources. The gain medium is made into a very thin disk-like crystal structure (diameter of about 10-25 mm, thickness of about 100-300 μm), which significantly improves the heat dissipation efficiency of the crystal, allowing a very high pump power density without too high a temperature rise in the crystal, and effectively improves the beam quality of the output laser. Since the concept of thin-film laser was proposed by Adolf Giesen et al. at the University of Stuttgart, Germany, in 1994, thin-film lasers have been favored by domestic and foreign research institutes for their unique structural advantages and excellent output performances, and a series of researches have been carried out by various research institutions on the continuous and pulsed operation of thin-film lasers.
With the advantages of excellent beam quality and efficient optical-to-optical conversion efficiency, thin-film lasers have become one of the ideal solutions for the next generation of high-power, high-energy, high-peak-power lasers, and have been increasingly widely used in many fields such as industrial manufacturing and basic scientific research. However, at present, the key core technologies such as precision processing of thin-film crystals, design and packaging of heat sink systems, and preparation of gain devices are insufficient in China, which seriously limits the further development of high-power thin-film lasers.
The expert group agreed that the development of thin-film laser is of great significance to the development of China's laser technology, and fully affirmed the progress of R&D and industrialization of domestic thin-film lasers and core devices since the implementation of the project, and unanimously agreed to pass the demonstration of the implementation plan. At the same time, we hope to continue to accelerate the industrialization of thin-film lasers, and contribute to China's high-end manufacturing industry.
